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8 rows · VERIZON PANTECH USB MODEM DRIVER INFO: Type: Driver: File Name. 8 rows · Jan 08, · Drivers installer for pantech usb modem serial port com9 if you don t want to waste time on. Please consider upgrading to a newer device by logging in to My Verizon, or visit the Pantech site for support or the Verizon Community where you can post your question to find answers. The devices no longer supported include the following: Pantech 4G LTE Global USB Modem UML; Pantech Breakout™ Pantech Caper™ Pantech Crux™ Pantech.
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Applied Materials continues to reinvent the transistor – HK / MG structures mastered
So that chip manufacturers can continue to increase the density of elements on the surface of a semiconductor crystal, it is time to make changes to the structure of the basic element of microcircuits – the transistor. This is the conclusion reached by Applied Materials. The content of the changes is the use of new materials and technical processes, which should have a positive effect on the size, speed and energy consumption of devices.
Applied Materials has developed a technology for the serial production of transistors with high dielectric insulator and metal gates (high-k / metal gate, HK / MG).
Starting at 45 nm, the transistors used in logic circuits become so small that conventional gate materials become ineffective – leakage currents heat the transistors and lead to increased power consumption. HK / MG structures, according to experts, provide a 100-fold reduction in leakage current and significantly increase the switching speed.
The complexity of using HK / MG in mass production is associated with the need to integrate these materials into the manufactured microcircuit with high accuracy. In fact, we are talking about manipulations at the atomic level. There are several approaches to fabricating HK / MG structures. The company offers a field-proven set of manufacturing steps that can be integrated into existing manufacturing processes, supplying not just a film with a high dielectric constant, but a turnkey solution, the so-called “stack”, which combines four processes within a single Centura platform: high-k deposition, oxidation, nitriding (nitriding) and annealing. Applied proposes to form metal gates using solutions that are part of the Endura platform, using ALD (atomic layer deposition) and PVD (physical vapor deposition) technologies, which expands the range of applications of the new development.
At the Maydan Technology Center, the company demonstrated the successful fabrication and validation of HK / MG structures for logic chips and flash memory using 22nm standards.
Source: Applied Materials